Technos Instruments

ECR Plasma

• High density ECR plasma source with a proprietary “permanent magnet” and microwave generator

• Corrosive and toxic gas compatible:

• CVD: Silane- and hydrocarbon-based

• Etching: Chlorine, Fluorine and Methane/Hydrogen Based

• Wafer size 75 - 300mm

Hot Filament or Hot Wire CVD System

• Larger Usable Deposition Area— 14” X 15” (350mm X 375mm)

• 2D and 3D Coatings— easily configured for planer or complex shape coatings

• Excellent Film Uniformity— ±10% over 300mm

• High Production Capacity— fully accessible large chamber size with 1/2 hour  turnaround

• Low Cost Operation— < 0.4 kWh power consumption per cubic mm of diamond deposited

• Computer-Controlled Deposition— consistent film thickness and grain size for production; flexible control of deposition for R&D

• Real Time Data Collection & Analysis— links to multiple network protocols for remote monitoring & analysis

Microwave Plasma CVD Systems        

• Available with 1.5 kW or 3.0 kW Microwave Power

• Semi-Auto and Manual Operation

• Equipped with Heated Stage Including a Highly Reliable RF Induction Heater

• Pressure Operation Range 4-200 Torr

• Motorized z-axis Position Control

• Thermal CVD

• Multi Diagnostic Ports

• In-situ measurements of

• Nucleation and Film thickness (by pyrometer)

• Plasma Diagnostics (by emission spectroscopy)2. Model AX5200-ECR3.  Model 5.0 kW4.  Model 6.0 kW to 8.0 kW5.  

• Model AX6600

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Thermal CVD Equipments

• Ready to use standard recipes for SWCNTs and MWCNTs are provided with the system 

• Customized recipes for SWCNTs and MWCNTs are made available on request

• Furnaces with maximum operating temperature of 1200ºC, with small to large heating zone lengths (optional)

• Additional accessories to directly insert the Ferrocene/liquid carbon source

• Additional accessories to water-assist growth of carbon nanotubes