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Technos Instruments

Jaipur, Rajasthan

Year of Establishment: 2006
IndiaMART Member Since: 2009
Products [24]
Phone: +(91)-(141)-2440061

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Process Equipments



ECR Plasma CVD

ECR Plasma CVD

ECR Plasma


 (PROCESS SOLUTIONS FOR DIAMOND LIKE CARBON AND NANO-CRYSTALLINE DIAMOND)

  1. ECR Plasma System for larger area process

 


Features
 
  • High density ECR plasma source with a proprietary “permanent magnet” and microwave generator

  • Corrosive and toxic gas compatible:

  • CVD: Silane- and hydrocarbon-based

  • Etching: Chlorine, Fluorine and Methane/Hydrogen Based

  • Wafer size 75 - 300mm


 
 

Hot Filament/Wire CVD

Hot Filament/Wire CVD

Hot Filament or Hot Wire CVD System


           (PROCESS SOLUTIONS FOR LARGER AREA HIGH QUALITY DIAMOND FILMS FOR PRODUCTION)



 
  1. sp3 Model 650 Hot Filament CVD Reactor

 


Features
 
  • Larger Usable Deposition Area— 14” X 15” (350mm X 375mm)

  • 2D and 3D Coatings— easily configured for planer or complex shape coatings

  • Excellent Film Uniformity— ±10% over 300mm

  • High Production Capacity— fully accessible large chamber size with 1/2 hour  turnaround

  • Low Cost Operation— < 0.4 kWh power consumption per cubic mm of diamond deposited

  • Computer-Controlled Deposition— consistent film thickness and grain size for production; flexible control of deposition for R&D

  • Real Time Data Collection & Analysis— links to multiple network protocols for remote monitoring & analysis


 
 

Microwave Plasma Cvd

Microwave Plasma Cvd

Microwave Plasma CVD Systems        


            (PROCESS SOLUTIONS FOR  HIGHEST QUALITY DIAMOND FILMS/VERTICALLY ALIGNED CARBON NANOTUBES)

  1. Model 1.5 kW 

 


Features
 
  • Available with 1.5 kW or 3.0 kW Microwave Power

  • Semi-Auto and Manual Operation

  • Equipped with Heated Stage Including a Highly Reliable RF Induction Heater

  • Pressure Operation Range 4-200 Torr

  • Motorized z-axis Position Control

  • Thermal CVD

  • Multi Diagnostic Ports

  • In-situ measurements of

  • Nucleation and Film thickness (by pyrometer)

  • Plasma Diagnostics (by emission spectroscopy)2. Model AX5200-ECR3.  Model 5.0 kW4.  Model 6.0 kW to 8.0 kW5.  

  • Model AX6600



 
 

Thermal Cvd

Thermal Cvd

Thermal CVD Equipments


 (PROCESS SOLUTIONS FOR R&D TO LARGE-SCALE PRODUCTION OF SINGLE AND MULTI WALLED CARBON NANOTUBE 

(SWCNT AND MWCNT, RESPECTIVELY), USING FIX BED METHOD)

Features

 

  • Ready to use standard recipes for SWCNTs and MWCNTs are provided with the system 

  • Customized recipes for SWCNTs and MWCNTs are made available on request

  • Furnaces with maximum operating temperature of 1200ºC, with small to large heating zone lengths (optional)

  • Additional accessories to directly insert the Ferrocene/liquid carbon source

  • Additional accessories to water-assist growth of carbon nanotubes


 
 

 

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