Vacuum Techniques Private Limited

Product Code : vt-LTCU

Description

Vacuum Techniques Coating unit is designed for laboratory use for general purpose evaporation specially suitable for R&D. it is a user friendly unit for electronics, electrical, optical industry. Also larger models are available for regular production.

The choice of accessories covers the following : Resistance Heating Electron Beam Evaporation D.C. Sputtering Glow Discharging, Cleaning Radiant Heater of Substrates etc. The Coating Unit covers application in Micro Electronic, Optics, Metallurgy, Electron Microscopy etc. The coating unit features a specially designed Diffusion Pump and fitted with Liquid Nitrogen Trap ensuring clean vacuum and rapid pump down cycle. It essentially consists of : High Vacuum Pumping System : this consists of diffusion pump suitable for general pumping of gases in any chamber. The basic system is capable of giving a vacuum of order 10-6mbar. The system contains rotary pump, diffusion pump along with vacuum valves etc. It also consists of a combined analog or digital Pirani penning gauges which moniters vacuum of backing, roughing and high vacuum. Metal Belljar with water cooling facility, the belljar is made out of SS304 and is leak tested by MSLD to leak rate better than 1x10-8 std cc./sec. The Belljar is compatible to high vacuum . Base plate is fitted with LT and of HT electrodes. It is made of SS304 material and also houses. The crystal holder feedthroughs, ion cleaning electrodes etc., HT and LT power supplies with variac Provision for introducing digital thickness monitor For larger unit, belljar lifting facility provided. Safety Devices : Water flow switches to put off the D.P heater under water supply failure. Thermostat switch protects Diffusion Pump from excessive heating. DP is interlocked with Rotary Pump. Electrical over load switch.

Product Code : vt-PN

Description

The Plasma Nitriding System essentially consist of chamber made of SS 304 material with required No. of ports, a mounting stand to mount the chamber, hydraulic lifting mechanism to lift the whole chamber from base plate assembly, a pumping system consisting of Roots Blower and a suitable Rotary Pump to achieve a ultimate vacuum of 10-3 mbar.

Vacuum measuring gauges, Gas Handling System for mixing Nitrogen and Hydrogen consisting of a Mass Flow Controller and close loop controlled conductance solenoid valve. Suitable pulsed power supply for nitriding.